株式会社 美和製作所 Miwa, Since 1975, Made in Japan, Atmosphere Technology Company

clean ovens | クリーンオーブン

Outline | 概要

Epoch-making heating device assuring chemical resistance and temperature uniformity.  
Best device for calcining electronic elements.
This oven device is suitable particularly for the formation of copper wirings or the preparation of low-induction laminated insulation films, and provides temperature uniformity under 500°C.
This oven device incorporates a special heater unit arranged to be hardly corroded by gas generated from the sample in the oven device.
 

Feature | 特徴

Applicable for wafers of 300mmφ and glass 370mm x 470mm  
Good temperature uniformity in a temperature zone under 500°C  
there is used a special heater unit arranged to be hardly corroded by gas generated from the sample in the oven device.  
Special heater unit readily repleceable  
Provision is made such that the sample is not contaminated by gas generated by heating.  

Feature | 特徴

  Oven Sizes : 680mmWx600mmDx560mmH
 
  Vacuum Degree : 6.65Pa(1.3×10-3Pa) for special order  
  Max. Temp.:800℃  
  Temp.Rising Speed:10℃/min
Temp.Lowering Speed:4℃/min
 
  Temp.Uniformity : within ±2°C for wafer of 300mm (at 450°C)  
  Atmospheric Gas:N2/Ar  

Specs | 仕様

 
 
   
  at140℃ at450℃  
     

Feature | 特徴

Vacuum pump protective trap
 
Inside atmosphere monitoring oximeter (operable in a Vacuum)  
Exhaust gas treating device  
For other requirements,consult us.